The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2024
Filed:
Oct. 19, 2020
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Filippo Alpeggiani, Eindhoven, NL;
Henricus Petrus Maria Pellemans, Veldhoven, NL;
Sebastianus Adrianus Goorden, Eindhoven, NL;
Simon Reinald Huisman, Eindhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 7/00 (2006.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
G03F 9/7046 (2013.01); G03F 7/70091 (2013.01); G03F 7/70133 (2013.01); G03F 7/70516 (2013.01);
Abstract
Disclosed is a method of metrology such as alignment metrology. The method comprises obtaining pupil plane measurement dataset at a pupil plane relating to scattered radiation resultant from a measurement of a structure. The method comprises determining a measurement value or correction therefor using the pupil plane measurement dataset and a sensor term relating to sensor optics used to perform said measurement.