The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 18, 2024

Filed:

Mar. 31, 2022
Applicant:

Texas Instruments Incorporated, Dallas, TX (US);

Inventors:

Alexei Sadovnikov, Sunnyvale, CA (US);

Guruvayurappan S. Mathur, Allen, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01); H01L 21/265 (2006.01); H01L 21/761 (2006.01); H01L 29/66 (2006.01); H01L 29/73 (2006.01);
U.S. Cl.
CPC ...
H01L 29/0619 (2013.01); H01L 21/26513 (2013.01); H01L 21/761 (2013.01); H01L 29/66234 (2013.01); H01L 29/73 (2013.01);
Abstract

A method includes implanting dopant of a first conductivity type into an epitaxial layer of semiconductor material to form first and second false collector regions adjacent to the surface of the epitaxial layer. The first false collector region is located laterally on a first side of a base region. The base region is formed within the epitaxial layer from dopant of a second conductivity type that is opposite the first conductivity type. The second false collector region is located laterally on a second side of the base region. The second side is opposite the first side of the base region. The base region is a base of a parasitic bipolar junction in an isolation region of an active semiconductor device.


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