The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 18, 2024

Filed:

Aug. 08, 2019
Applicant:

Ulvac, Inc., Chigasaki, JP;

Inventors:

Genji Sakata, Chigasaki, JP;

Hidekazu Yokoo, Chigasaki, JP;

Assignee:

ULVAC, INC., Chigasaki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/50 (2006.01); C23C 14/48 (2006.01); C23C 14/50 (2006.01); H01L 21/683 (2006.01); H01L 21/265 (2006.01);
U.S. Cl.
CPC ...
H01L 21/6833 (2013.01); C23C 14/48 (2013.01); C23C 14/50 (2013.01); H01L 21/265 (2013.01);
Abstract

[Object] To provide an electrostatic chuck that stably supports a substrate while suppressing a rapid increase in the volume of a gas, a vacuum processing apparatus, and a substrate processing method. [Solving Means] An electrostatic chuck according to an embodiment of the present invention includes: a chuck plate that has a first surface supporting a substrate and a second surface opposite to the first surface. The chuck plate includes an exhaust passage that exhausts a gas from between the substrate and the first surface, the gas being emitted from the substrate between the substrate and the first surface when the substrate is supported by the first surface.


Find Patent Forward Citations

Loading…