The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 2024
Filed:
Feb. 26, 2020
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/31 (2006.01); C23C 16/02 (2006.01); C23C 16/26 (2006.01); C23C 16/511 (2006.01); H01J 37/32 (2006.01); H01L 21/02 (2006.01); H01L 21/285 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32724 (2013.01); C23C 16/0218 (2013.01); C23C 16/26 (2013.01); C23C 16/511 (2013.01); H01J 37/3222 (2013.01); H01J 37/32357 (2013.01); H01L 21/02115 (2013.01); H01L 21/02274 (2013.01); H01L 21/02527 (2013.01); H01L 21/0262 (2013.01); H01L 21/28556 (2013.01); H01J 2237/3321 (2013.01); H01L 21/02444 (2013.01); H01L 21/02658 (2013.01);
Abstract
A method of forming a graphene structure, includes: providing a substrate; performing a preprocessing by supplying a first processing gas including a carbon-containing gas to the substrate while heating the substrate, without using plasma; and after the preprocessing, forming the graphene structure on a surface of the substrate through a plasma CVD using plasma of a second processing gas including a carbon-containing gas.