The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 18, 2024
Filed:
Jul. 20, 2021
Samsung Electronics Co., Ltd., Suwon-si, KR;
Nam Kyun Kim, Seoul, KR;
Tae-Sun Shin, Hwaseong-si, KR;
Deokjin Kwon, Suwon-si, KR;
Donghyeon Na, Hwaseong-si, KR;
Seungbo Shim, Seoul, KR;
Sungyong Lim, Seoul, KR;
Minjoon Kim, Gwangmyeong-si, KR;
Jin Young Bang, Hwaseong-si, KR;
Bongju Lee, Hwaseong-si, KR;
Jinseok Lee, Seoul, KR;
Sungil Cho, Seoul, KR;
Chungho Cho, Suwon-si, KR;
Abstract
A method of fabricating a semiconductor device include; seating a substrate having a substrate radius on an electrostatic chuck, applying first radio-frequency power to the electrostatic chuck to induce plasma in a region at least above the electrostatic chuck, and generating a magnetic field in the region at least above the electrostatic chuck using a magnet having a ring-shape and disposed above the electrostatic chuck by applying second radio-frequency power to the magnet, wherein the magnet has an inner radius ranging from about one-half to about one-fourth of the substrate radius.