The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 04, 2024

Filed:

Aug. 13, 2021
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Oreste Madia, Hsinchu, TW;

Georgios Vellianitis, Heverlee, BE;

Gerben Doornbos, Kessel-Lo, BE;

Marcus Johannes Henricus Van Dal, Linden, BE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/267 (2006.01); H01L 21/28 (2006.01); H01L 29/51 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H01L 29/267 (2013.01); H01L 29/40111 (2019.08); H01L 29/516 (2013.01); H01L 29/6684 (2013.01); H01L 29/78391 (2014.09);
Abstract

A semiconductor device is provided. The semiconductor device includes a gate layer, a semiconductor layer and a ferroelectric layer disposed between the gate layer and the semiconductor layer. The semiconductor layer includes a first material containing a Group III element, a rare-earth element and a Group VI element, the ferroelectric layer includes a second material containing a Group III element, a rare-earth element and a Group V element and the gate layer includes a third material containing a Group III element and a rare-earth element. A method of fabricating a semiconductor device is also provided.


Find Patent Forward Citations

Madia, Oreste. (2024). Semiconductor device and fabrication method thereof (U.S. Patent No. 12002860). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12002860

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…