The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 04, 2024
Filed:
Nov. 09, 2022
Shanghai Institute of Technical Physics Chinese Academy of Sciences, Shanghai, CN;
Jingjing Liu, Shanghai, CN;
Jianlu Wang, Shanghai, CN;
Tianle Guo, Shanghai, CN;
Xinning Huang, Shanghai, CN;
Xiangjian Meng, Shanghai, CN;
Hong Shen, Shanghai, CN;
Tie Lin, Shanghai, CN;
Junhao Chu, Shanghai, CN;
Abstract
The present disclosure relates to the field of preparation of compound semiconductor nanomaterials, and in particular to a method for in-situ modification of mercury quantum dots in a traditional thermal injection process. It is characterized in that, in the traditional thermal injection process for synthesis of HgTe quantum dots, after a certain reaction time, a low boiling point polar solvent that is incompatible with a reaction solvent is rapidly injected, so that an interfacial separation of two liquid phases occurs in a mixed reaction, and then a selective crystal oriented surface modification is conducted on surfaces of mercury quantum dots.