The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 21, 2024
Filed:
Mar. 31, 2021
Applicant:
Fei Company, Hillsboro, OR (US);
Inventors:
Bart Buijsse, Eindhoven, NL;
Hans Raaijmakers, Eindhoven, NL;
Peter Christiaan Tiemeijer, Eindhoven, NL;
Assignee:
FEI Company, Hillsboro, OR (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 23/2055 (2018.01); G01N 23/20025 (2018.01); G01N 23/207 (2018.01);
U.S. Cl.
CPC ...
G01N 23/2055 (2013.01); G01N 23/20025 (2013.01); G01N 23/207 (2013.01); G01N 2223/0565 (2013.01); G01N 2223/102 (2013.01); G01N 2223/604 (2013.01);
Abstract
Molecular structure of a crystal may be solved based on at least two diffraction tilt series acquired from a sample. The two diffraction tilt series include multiple diffraction patterns of at least one crystal of the sample acquired at different electron doses. In some examples, the two diffraction tilt series are acquired at different magnifications.