The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 2024
Filed:
May. 10, 2019
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); B23K 26/144 (2014.01); B23K 26/34 (2014.01); B33Y 10/00 (2015.01); B33Y 50/00 (2015.01); B33Y 80/00 (2015.01); C23C 16/48 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4404 (2013.01); B23K 26/144 (2015.10); B23K 26/34 (2013.01); B33Y 10/00 (2014.12); B33Y 80/00 (2014.12); C23C 16/44 (2013.01); C23C 16/483 (2013.01); C23C 16/487 (2013.01); H01J 37/32477 (2013.01); H01J 37/32642 (2013.01); H01J 37/32935 (2013.01); B33Y 50/00 (2014.12); H01J 2237/332 (2013.01); H01J 2237/334 (2013.01);
Abstract
A forming method of a component used in a plasma processing apparatus includes irradiating an energy beam to a source material of the component while supplying the source material based on a surface state of the component.