The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 2024
Filed:
May. 14, 2019
Asml Netherlands B.v., Veldhoven, NL;
Jen-Shiang Wang, Sunnyvale, CA (US);
Qian Zhao, San Jose, CA (US);
Yunbo Guo, San Jose, CA (US);
Yen-Wen Lu, Saratoga, CA (US);
Mu Feng, San Jose, CA (US);
Qiang Zhang, Campbell, CA (US);
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A method for improving a process model for a patterning process, the method including obtaining a) a measured contour from an image capture device, and b) a simulated contour generated from a simulation of the process model. The method also includes aligning the measured contour with the simulated contour by determining an offset between the measured contour and the simulated contour. The process model is calibrated to reduce a difference, computed based on the determined offset, between the simulated contour and the measured contour.