The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 23, 2024

Filed:

May. 10, 2019
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Michishige Saito, Miyagi, JP;

Kazuya Nagaseki, Miyagi, JP;

Shota Kaneko, Miyagi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B28B 1/00 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32495 (2013.01); B28B 1/001 (2013.01); H01J 37/32559 (2013.01); H01J 37/32724 (2013.01); H01J 37/32807 (2013.01); H01J 2237/332 (2013.01); H01J 2237/334 (2013.01);
Abstract

A forming method of a component for use in a plasma processing apparatus includes irradiating, while supplying a source material of a first ceramic and a source material of a second ceramic different from the first ceramic, an energy beam to the source material of the first ceramic and the source material of the second ceramic.


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