The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 23, 2024
Filed:
Mar. 08, 2019
Applicant:
Hitachi High-tech Corporation, Tokyo, JP;
Inventors:
Wen Li, Tokyo, JP;
Hajime Kawano, Tokyo, JP;
Momoyo Enyama, Tokyo, JP;
Makoto Sakakibara, Tokyo, JP;
Assignee:
HITACHI HIGH-TECH CORPORATION, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/153 (2006.01); H01J 37/147 (2006.01); H01J 37/20 (2006.01);
U.S. Cl.
CPC ...
H01J 37/153 (2013.01); H01J 37/1475 (2013.01); H01J 37/20 (2013.01);
Abstract
Deflection of a secondary beam, and astigmatism correction of a primary beam or of the secondary beam are carried out using a multi-pole electromagnetic deflector which deflects the path of the secondary beam toward a detector.