The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 09, 2024
Filed:
Sep. 20, 2022
Applicant:
Bruker Nano, Inc., Santa Barbara, CA (US);
Inventor:
Jeffrey Wong, Simi Valley, CA (US);
Assignee:
Bruker Nano, Inc., Santa Barbara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01Q 60/38 (2010.01); C23C 16/02 (2006.01); C23C 16/34 (2006.01); C23C 16/44 (2006.01); C23C 16/56 (2006.01); G01Q 60/36 (2010.01); G01Q 70/10 (2010.01);
U.S. Cl.
CPC ...
G01Q 60/38 (2013.01); C23C 16/0227 (2013.01); C23C 16/345 (2013.01); C23C 16/44 (2013.01); C23C 16/56 (2013.01); G01Q 60/366 (2013.01); G01Q 70/10 (2013.01);
Abstract
A large radius probe for a surface analysis instrument such as an atomic force microscope (AFM). The probe is microfabricated to have a tip with a hemispherical distal end or apex. The radius of the apex is the range of about a micron making the probes particularly useful for nanoindentation analyses, but other applications are contemplated. In particular, tips with aspect ratios greater than 2:1 can be made for imaging, for example, semiconductor samples. The processes of the preferred embodiments allow such large radius probes to be batch fabricated to facilitate cost and robustness.