The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 12, 2024

Filed:

Apr. 03, 2023
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Yu-I Shih, Taichung, TW;

Ren-Hua Guo, Taichung, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10B 10/00 (2023.01); H01L 21/02 (2006.01); H01L 21/3065 (2006.01); H01L 21/8238 (2006.01); H01L 29/04 (2006.01); H01L 29/165 (2006.01); H01L 29/66 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H10B 10/12 (2023.02); H01L 21/02293 (2013.01); H01L 21/3065 (2013.01); H01L 21/823821 (2013.01); H01L 29/045 (2013.01); H01L 29/165 (2013.01); H01L 29/66795 (2013.01); H01L 29/7853 (2013.01); H01L 29/7854 (2013.01);
Abstract

A device includes a substrate, a pull-down transistor over the substrate, a pass-gate transistor over the substrate, and a pull-up transistor over the substrate. The pull-up transistor includes a first gate structure and first source/drain epitaxy structures on opposite sides of the first gate structure, in which each of the first source/drain epitaxy structures comprises a first epitaxy layer and a second epitaxy layer over the first epitaxy layer, wherein a germanium concentration of the first epitaxy layer is higher than a germanium concentration of the second epitaxy layer.


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