The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 05, 2024

Filed:

Apr. 12, 2021
Applicant:

Taiwan Semiconductor Manufacturing Company Limited, Hsinchu, TW;

Inventors:

Hung Wei Li, Hsinchu, TW;

Mauricio Manfrini, Zhubei, TW;

Sai-Hooi Yeong, Zhubei, TW;

Yu-Ming Lin, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/786 (2006.01); H01L 29/40 (2006.01); H01L 29/417 (2006.01); H01L 29/423 (2006.01); H01L 29/66 (2006.01); H10B 51/30 (2023.01); H10B 51/40 (2023.01); H10B 61/00 (2023.01); H10B 63/00 (2023.01);
U.S. Cl.
CPC ...
H01L 29/78618 (2013.01); H01L 29/401 (2013.01); H01L 29/41733 (2013.01); H01L 29/41775 (2013.01); H01L 29/42384 (2013.01); H01L 29/66742 (2013.01); H01L 29/78642 (2013.01); H01L 29/7869 (2013.01); H01L 29/78696 (2013.01); H10B 51/30 (2023.02); H10B 51/40 (2023.02); H10B 61/22 (2023.02); H10B 63/34 (2023.02); H10B 63/80 (2023.02);
Abstract

A thin film transistor and method of making the same, the thin film transistor including: a substrate; a word line disposed on the substrate; a semiconductor layer disposed on the substrate, the semiconductor layer having a source region, a drain region, and a channel region disposed between the source and drain regions and overlapping with the word line in a vertical direction perpendicular to a plane of the substrate; a hydrogen diffusion barrier layer overlapping with the channel region in the vertical direction; a gate dielectric layer disposed between the channel region and the word line; and source and drain electrodes respectively electrically coupled to the source and drain regions.


Find Patent Forward Citations

Li, Hung. (2024). Transistor including hydrogen diffusion barrier film and methods of forming same (U.S. Patent No. 11923459). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11923459

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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