The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2024
Filed:
Mar. 04, 2021
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventors:
Matthias Manger, Aalen-Unterkochen, DE;
Florian Baumer, Oberkochen, DE;
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01J 1/42 (2006.01); G01J 1/04 (2006.01); H05G 2/00 (2006.01);
U.S. Cl.
CPC ...
G01J 1/4257 (2013.01); G01J 1/0418 (2013.01); H05G 2/008 (2013.01);
Abstract
A metrology system includes a first beam analysis system for analyzing at least one first measurement beam that was coupled from the excitation laser beam before a reflection on the target material and a second beam analysis system for analyzing at least one second measurement beam that was coupled from the excitation laser beam after a reflection on the target material. Each of the first beam analysis system and the second beam analysis system has at least one wavefront sensor system.