The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2024
Filed:
Feb. 03, 2021
Ebara Corporation, Tokyo, JP;
Nobuyuki Takada, Tokyo, JP;
Hozumi Yasuda, Tokyo, JP;
Ebara Corporation, Tokyo, JP;
Abstract
Polishing uniformity of a surface to be polished of a substrate is improved by appropriately according with a state of the surface to be polished during polishing. A substrate processing apparatus includes a tablefor supporting a substrate WF, a pad holderfor holding a polishing padfor polishing the substrate WF supported by the table, an elevating mechanism for elevating the pad holderwith respect to the substrate WF, a swing mechanism for swinging the pad holderin a radial direction of the substrate WF, supporting membersA andB for supporting the polishing padswung to outside the tableby the swing mechanism, and driving mechanismsandfor adjusting at least one of a height and a distance to the substrate WF of the supporting memberwhile polishing the substrate WF.