The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2024
Filed:
Mar. 04, 2021
Applicant:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
Inventors:
Assignee:
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/68 (2006.01); H01L 21/66 (2006.01); H01L 21/687 (2006.01); H01L 21/67 (2006.01); H01L 21/3065 (2006.01);
U.S. Cl.
CPC ...
H01L 22/20 (2013.01); H01L 21/3065 (2013.01); H01L 21/67069 (2013.01); H01L 21/68764 (2013.01);
Abstract
An etching apparatus is provided to be able to rotate or tilt a substrate holder on which a to-be-processed substrate is placed. According to a profile of a pre-process critical dimension of the substrate, the etching apparatus may rotate or tilt the substrate holder during an etching process in order to achieve a desired profile of a post-process critical dimension of the substrate that is related to the pre-process critical dimension.