The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2024
Filed:
May. 14, 2021
Applied Materials, Inc., Santa Clara, CA (US);
Guoheng Zhao, Palo Alto, CA (US);
Venkatakaushik Voleti, Milpitas, CA (US);
Todd Egan, Fremont, CA (US);
Kyle R. Tantiwong, Livermore, CA (US);
Andreas Schulze, Campbell, CA (US);
Niranjan Ramchandra Khasgiwale, San Jose, CA (US);
Mehdi Vaez-Iravani, Los Gatos, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Methods and systems for monitoring etch or deposition processes using image-based in-situ process monitoring techniques include illuminating a measurement area on a sample disposed in a process chamber. The measurement area is illuminated using an input beam generated remote from the process chamber and transmitted to a first viewing window of the process chamber by a first optical fiber. Portions of the first input beam reflected from the measurement area are transmitted from the first viewing window to an imaging sensor by a second optical fiber. A sequence of images is obtained at the imaging sensor, and a change in reflectance of pixels within each of the images is determined. The etch or deposition process is monitored based on the change in reflectance.