The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2024
Filed:
Jun. 02, 2021
Applicant:
Stratasys Ltd., Rehovot, IL;
Inventors:
Assignee:
Stratasys Ltd., Rehovot, IL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B29C 64/112 (2017.01); C09D 11/52 (2014.01); H05K 3/12 (2006.01); H05K 3/46 (2006.01); B33Y 10/00 (2015.01); C09D 11/30 (2014.01); B33Y 50/02 (2015.01); B33Y 70/00 (2020.01); C09D 133/14 (2006.01); C09D 133/26 (2006.01); H05K 1/18 (2006.01); H05K 3/30 (2006.01); H05K 1/09 (2006.01); B29K 105/00 (2006.01);
U.S. Cl.
CPC ...
B29C 64/112 (2017.08); B33Y 10/00 (2014.12); B33Y 50/02 (2014.12); B33Y 70/00 (2014.12); C09D 11/30 (2013.01); C09D 11/52 (2013.01); C09D 133/14 (2013.01); C09D 133/26 (2013.01); H05K 1/186 (2013.01); H05K 3/125 (2013.01); H05K 3/1283 (2013.01); H05K 3/30 (2013.01); H05K 3/4664 (2013.01); B29K 2105/0005 (2013.01); H05K 1/092 (2013.01); H05K 2203/013 (2013.01);
Abstract
A method of fabricating a cross-layer pattern in a layered object is disclosed. The method is executed by an additive manufacturing system and comprises: dispensing a patterning material onto a receiving medium to form a first pattern element; dispensing a first layer of modeling material onto the first pattern element while forming a first open cavity exposing at least a portion of the first pattern element beneath the first layer; and dispensing patterning material onto the exposed portion of the first pattern element and the first layer to form a second pattern element contacting the first pattern element.