The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 30, 2024

Filed:

Nov. 08, 2021
Applicant:

Yangtze Memory Technologies Co., Ltd., Wuhan, CN;

Inventor:

Jun Liu, Wuhan, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/00 (2006.01); H01L 21/768 (2006.01); H01L 23/48 (2006.01); H01L 25/065 (2023.01); H01L 25/18 (2023.01); H01L 25/00 (2006.01);
U.S. Cl.
CPC ...
H01L 24/09 (2013.01); H01L 21/76898 (2013.01); H01L 23/481 (2013.01); H01L 24/08 (2013.01); H01L 24/80 (2013.01); H01L 25/0657 (2013.01); H01L 25/18 (2013.01); H01L 25/50 (2013.01); H01L 2224/08146 (2013.01); H01L 2224/09181 (2013.01); H01L 2224/80895 (2013.01); H01L 2224/80896 (2013.01); H01L 2224/80905 (2013.01); H01L 2225/06544 (2013.01);
Abstract

Embodiments of semiconductor devices and fabrication methods thereof are disclosed. In an example, a semiconductor device includes a first semiconductor structure and a second semiconductor structure. The first semiconductor structure includes a first bonding layer having a plurality of first bonding contacts, and a first via structure extending vertically through the first bonding layer and into the first semiconductor structure. The second semiconductor structure includes a second bonding layer having a plurality of second bonding contacts, and a second via structure extending vertically through the second bonding layer and into the second semiconductor structure. The first bonding contacts are in contact with the second bonding contacts at the bonding interface, the first via structure is in contact with the second via structure, and sidewalls of the first via structure and the second via structures have a staggered profile at the bonding interface.


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