The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 30, 2024

Filed:

Jan. 08, 2021
Applicant:

Comet Technologies Usa, Inc., San Jose, CA (US);

Inventors:

Stephen E. Savas, San Jose, CA (US);

Alexandre De Chambrier, San Jose, CA (US);

Assignee:

COMET TECHNOLOGIES USA, INC., San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32568 (2013.01); H01J 37/3255 (2013.01); H01J 37/32183 (2013.01); H01J 37/32577 (2013.01);
Abstract

A radio frequency plasma processing system including a reaction chamber, an electrode having an electrode symmetry axis, the electrode disposed in the reaction chamber, and a plurality of plates, each having an electrically conducting layer, disposed in the reaction chamber azimuthally with respect to the electrode symmetry axis around a perimeter of the electrode at a gap from the electrode surface, each of the plurality of plates connected to an electrical ground through a variable reactance circuit.


Find Patent Forward Citations

Quick Actions:

Savas, Stephen. (2024). Sector shunts for plasma-based wafer processing systems (U.S. Patent No. 11887820). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11887820

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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