The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 23, 2024
Filed:
Jun. 28, 2021
Applicant:
United Microelectronics Corp., Hsin-Chu, TW;
Inventors:
Wei-Hao Huang, New Taipei, TW;
Chun-Lung Chen, Tainan, TW;
Kun-Yuan Liao, Hsinchu, TW;
Lung-En Kuo, Tainan, TW;
Chia-Wei Hsu, Kaohsiung, TW;
Assignee:
UNITED MICROELECTRONICS CORP., Hsin-Chu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/308 (2006.01); H01L 21/306 (2006.01); H01L 21/027 (2006.01); G03F 1/38 (2012.01);
U.S. Cl.
CPC ...
H01L 21/3085 (2013.01); H01L 21/0274 (2013.01); H01L 21/30604 (2013.01); G03F 1/38 (2013.01);
Abstract
A method of cutting fins includes the following steps. A photomask including a snake-shape pattern is provided. A photoresist layer is formed over fins on a substrate. A photoresist pattern in the photoresist layer corresponding to the snake-shape pattern is formed by exposing and developing. The fins are cut by transferring the photoresist pattern and etching cut parts of the fins.