The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 23, 2024

Filed:

Jul. 20, 2022
Applicant:

Infineon Technologies Ag, Neubiberg, DE;

Inventors:

Iris Moder, Villach, AT;

Bernhard Goller, Villach, AT;

Tobias Franz Wolfgang Hoechbauer, Villach, AT;

Roland Rupp, Lauf, DE;

Francisco Javier Santos Rodriguez, Villach, AT;

Hans-Joachim Schulze, Taufkirchen, DE;

Assignee:

Infineon Technologies AG, Neubiberg, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 21/02 (2006.01); H01L 21/4757 (2006.01); H01L 21/475 (2006.01); H01L 21/467 (2006.01); H01L 29/739 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02203 (2013.01); H01L 21/0203 (2013.01); H01L 21/02293 (2013.01); H01L 21/02378 (2013.01); H01L 21/467 (2013.01); H01L 21/475 (2013.01); H01L 21/47576 (2013.01); H01L 29/7395 (2013.01); H01L 29/7802 (2013.01);
Abstract

A semiconductor substrate includes a base portion, an auxiliary layer and a surface layer. The auxiliary layer is formed on the base portion. The surface layer is formed on the auxiliary layer. The surface layer is in contact with a first main surface of the semiconductor substrate. The auxiliary layer has a different electrochemical dissolution efficiency than the base portion and the surface layer. At least a portion of the auxiliary layer and at least a portion of the surface layer are converted into a porous structure. Subsequently, an epitaxial layer is formed on the first main surface.


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