The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 23, 2024

Filed:

Feb. 14, 2022
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Wei Fang, Milpitas, CA (US);

Zhao-Li Zhang, San Jose, CA (US);

Jack Jau, Los Altos Hills, CA (US);

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2022.01); G06T 7/00 (2017.01); G06V 10/44 (2022.01); G06V 10/50 (2022.01); G06V 10/46 (2022.01);
U.S. Cl.
CPC ...
G06T 7/001 (2013.01); G06T 7/0004 (2013.01); G06V 10/44 (2022.01); G06V 10/50 (2022.01); G06T 2207/10004 (2013.01); G06T 2207/10061 (2013.01); G06T 2207/30148 (2013.01); G06V 10/467 (2022.01); G06V 2201/06 (2022.01);
Abstract

An inspection method includes the following steps: identifying a plurality of patterns within an image; and comparing the plurality of patterns with each other for measurement values thereof. The above-mentioned inspection method uses the pattern within the image as a basis for comparison; therefore, measurement values of the plurality of pixels constructing the pattern can be processed with statistical methods and then compared, and the false rate caused by variation of a few pixels is decreased significantly. An inspection system implementing the above-mentioned method is also disclosed.


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