The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 02, 2024

Filed:

Jan. 18, 2023
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Takashi Yamauchi, Koshi, JP;

Daiki Shibata, Koshi, JP;

Kohei Kawakami, Koshi, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/16 (2006.01); H01L 21/67 (2006.01); B05C 11/10 (2006.01); B05B 9/00 (2006.01); H01L 21/687 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
G03F 7/162 (2013.01); B05B 9/002 (2013.01); B05C 11/1042 (2013.01); H01L 21/6715 (2013.01); H01L 21/67017 (2013.01); H01L 21/67248 (2013.01); H01L 21/68764 (2013.01); H01L 21/0273 (2013.01);
Abstract

A liquid treatment apparatus includes: a substrate holder for holding a substrate; a discharge nozzle for discharging a treatment liquid onto the substrate; a liquid supply pipe for supplying the treatment liquid from a treatment liquid storage source to the discharge nozzle; a gas pipe that encompasses the liquid supply pipe and through which an inert gas for adjusting the temperature of the treatment liquid flows in a space between the gas pipe and the liquid supply pipe; a processing container in which the substrate holder, the discharge nozzle, the liquid supply pipe, and the gas pipe are provided; and an atmosphere gas supply part for supplying an atmosphere gas into the processing container. The gas pipe is provided so that an extension portion between an upstream end inside the processing container and an encompassing portion is folded back inside the processing container in a plan view.


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