The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 02, 2024

Filed:

Aug. 30, 2017
Applicant:

Acm Research (Shanghai) Inc., Shanghai, CN;

Inventors:

Zhaowei Jia, Shanghai, CN;

Hongchao Yang, Shanghai, CN;

Chenhua Lu, Shanghai, CN;

Jian Wang, Shanghai, CN;

Hui Wang, Shanghai, CN;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25D 5/08 (2006.01); C25D 13/22 (2006.01); C25D 17/00 (2006.01); C25D 17/06 (2006.01); C25D 21/12 (2006.01);
U.S. Cl.
CPC ...
C25D 5/08 (2013.01); C25D 13/22 (2013.01); C25D 17/002 (2013.01); C25D 17/06 (2013.01); C25D 21/12 (2013.01);
Abstract

A plating apparatus for depositing metal on a substrate, comprising a membrane frame (), a catholyte inlet pipe () and a center cap (). The membrane frame () has a center passage () which passes through the center of the membrane frame (). The catholyte inlet pipe () is connected to the center passage () of the membrane frame (). The center cap () is fixed at the center of the membrane frame () and covers over the center passage () of the membrane frame (). The top of the center cap () has a plurality of first holes (). The catholyte inlet pipe () supplies catholyte to the center cap () through the center passage () of the membrane frame (), and the catholyte is supplied to a center area of the substrate through the first holes () of the center cap ().


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