The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 24, 2023

Filed:

May. 19, 2022
Applicant:

SK Hynix Inc., Icheon-si, KR;

Inventors:

Jae Hyun Han, Icheon-si, KR;

Se Ho Lee, Yongin-si, KR;

Hyangkeun Yoo, Seongnam-si, KR;

Jae Gil Lee, Seoul, KR;

Assignee:

SK HYNIX INC., Icheon-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10B 51/20 (2023.01); H01L 29/788 (2006.01); H01L 29/78 (2006.01); H01L 29/786 (2006.01); H10B 51/10 (2023.01); H10B 51/30 (2023.01);
U.S. Cl.
CPC ...
H10B 51/20 (2023.02); H01L 29/7827 (2013.01); H01L 29/7889 (2013.01); H01L 29/78391 (2014.09); H01L 29/78642 (2013.01); H01L 29/78696 (2013.01); H10B 51/10 (2023.02); H10B 51/30 (2023.02);
Abstract

A nonvolatile memory device according to an embodiment includes a substrate having an upper surface, a source electrode structure disposed on the substrate, and a channel structure disposed over the substrate and disposed to contact one sidewall surface of the source electrode structure. In addition, the nonvolatile memory device includes a drain electrode structure disposed to contact one sidewall surface of the channel structure over the substrate. In addition, the nonvolatile memory device includes a plurality of ferroelectric structures extending in a first direction perpendicular to the substrate in the channel structure and disposed to be spaced apart from each other along the second direction perpendicular to the first direction. In addition, the nonvolatile memory device includes a gate electrode structure disposed in each of the plurality of ferroelectric structure to extend along the first direction.


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