The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 24, 2023

Filed:

Jun. 22, 2021
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Kazuki Kosai, Koshi, JP;

Yusuke Takamatsu, Koshi, JP;

Taisei Inoue, Koshi, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/02 (2006.01); B08B 3/14 (2006.01); B08B 13/00 (2006.01); B08B 3/08 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67051 (2013.01); B08B 3/08 (2013.01); B08B 3/14 (2013.01); B08B 13/00 (2013.01); H01L 21/02057 (2013.01); B08B 2203/007 (2013.01);
Abstract

A liquid processing apparatus includes a storage tank, a circulation line, a supply line, a return line and at least one filter. The storage tank stores a processing liquid therein. Through the circulation line, the processing liquid sent from the storage tank is returned back into the storage tank. The supply line connects the circulation line and a supply configured to supply the processing liquid onto a substrate. The return line is connected to the supply line, and the processing liquid is returned back into the storage tank from the supply line through the return line. The filter is provided in at least one of the supply line on an upstream side of a connection point between the return line and the supply line or the return line, and is configured to remove a foreign substance in the processing liquid.


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