The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 10, 2023

Filed:

Apr. 07, 2021
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Zhepeng Cong, San Jose, CA (US);

Schubert Chu, San Francisco, CA (US);

Nyi Oo Myo, San Jose, CA (US);

Kartik Bhupendra Shah, Saratoga, CA (US);

Zhiyuan Ye, San Jose, CA (US);

Richard O. Collins, Santa Clara, CA (US);

Assignee:

Applied Material, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/24 (2006.01); H01L 21/67 (2006.01); C23C 14/50 (2006.01);
U.S. Cl.
CPC ...
C23C 14/24 (2013.01); C23C 14/50 (2013.01); H01L 21/67017 (2013.01);
Abstract

Embodiments disclosed herein generally provide improved control of gas flow in processing chambers. In at least one embodiment, a liner for a processing chamber includes an annular body having a sidewall and a vent formed in the annular body for exhausting gas from inside to outside the annular body. The vent comprises one or more vent holes disposed through the sidewall. The liner further includes an opening in the annular body for substrate loading and unloading.


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