The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 10, 2023
Filed:
Aug. 25, 2022
Applied Materials, Inc., Santa Clara, CA (US);
Paul D. Butterfield, San Jose, CA (US);
Thomas H. Osterheld, Mountain View, CA (US);
Jeonghoon Oh, Saratoga, CA (US);
Shou-Sung Chang, Mountain View, CA (US);
Steven M. Zuniga, Soquel, CA (US);
Fred C. Redeker, Fremont, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A polishing system includes a platen having a top surface to support an annular polishing pad, a carrier head to hold a substrate in contact with the annular polishing pad, a support structure extending above the platen and to which one or more polishing system components are secured, and a support post. The platen is rotatable about an axis of rotation that passes through approximately a center of the platen. The first support post has an upper end coupled to and supporting the support structure and a lower portion that is supported on the platen or that extends through an aperture in the platen.