The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 03, 2023

Filed:

Apr. 22, 2021
Applicant:

Taiwan Semiconductor Manufacturing Company Limited, Hsinchu, TW;

Inventors:

Rainer Yen-Chieh Huang, Hsinchu, TW;

Hai-Ching Chen, Hsinchu, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H10N 30/30 (2023.01); H01L 29/417 (2006.01); H10N 30/071 (2023.01); H10N 30/87 (2023.01); H01L 29/786 (2006.01); H10N 30/50 (2023.01); H10N 30/098 (2023.01); G01L 1/16 (2006.01);
U.S. Cl.
CPC ...
H10N 30/302 (2023.02); H01L 29/41733 (2013.01); H01L 29/78696 (2013.01); H10N 30/071 (2023.02); H10N 30/098 (2023.02); H10N 30/50 (2023.02); H10N 30/871 (2023.02); G01L 1/16 (2013.01);
Abstract

A thin-film transistor may include an amorphous semiconductor channel layer, an organic material piezoelectric stress gate layer formed adjacent to the amorphous semiconductor channel layer, a source electrode coupled to the organic material piezoelectric stress gate layer, a drain electrode coupled to the organic material piezoelectric stress gate layer and a gate electrode coupled to the organic material piezoelectric stress gate layer. In some embodiments, the amorphous semiconductor channel layer may be amorphous indium gallium zinc oxide. In some embodiments, the organic material piezoelectric stress gate layer may be organic polyvinylidene fluoride. In some embodiments, the amorphous semiconductor channel layer may be formed on a flexible substrate.


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