The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 03, 2023
Filed:
Dec. 02, 2020
Applicant:
Synopsys, Inc., Mountain View, CA (US);
Inventors:
Victor Moroz, Saratoga, CA (US);
Xi-Wei Lin, Fremont, CA (US);
Assignee:
Synopsys, Inc., Sunnyvale, CA (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/3065 (2006.01); H01L 21/308 (2006.01); G06F 30/392 (2020.01); G06F 30/398 (2020.01); H01L 29/66 (2006.01);
U.S. Cl.
CPC ...
H01L 21/3065 (2013.01); G06F 30/392 (2020.01); G06F 30/398 (2020.01); H01L 21/308 (2013.01); H01L 29/66742 (2013.01); H01L 29/66795 (2013.01);
Abstract
At least one fin structure may be created on a silicon substrate. Next, a width of the at least one fin structure may be decreased by applying one or more iterations of a self-limiting fin etch process.