The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 2023
Filed:
Jan. 18, 2019
International Business Machines Corporation, Armonk, NY (US);
Benjamin D. Briggs, Waterford, NY (US);
Donald F. Canaperi, Bridgewater, CT (US);
Huy Cao, Rexford, NY (US);
Thomas J. Haigh, Jr., Claverack, NY (US);
Son Nguyen, Schenectady, NY (US);
Hosadurga Shobha, Niskayuna, NY (US);
Devika Sil, Rensselaer, NY (US);
Han You, Plano, TX (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method of fabricating a dielectric film includes depositing a first precursor on a substrate. The first precursor includes a cyclic carbosiloxane group comprising a six-membered ring. The method also includes depositing a second precursor on the substrate. The first precursor and the second precursor form a preliminary film on the substrate, and the second precursor includes silicon, carbon, and hydrogen. The method further includes exposing the preliminary film to energy from an energy source to form a porous dielectric film.