The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 12, 2023
Filed:
Nov. 16, 2020
Applicant:
Raytheon Company, Waltham, MA (US);
Inventors:
Michael J. Rondon, Santa Rosa, CA (US);
Jon Sigurdson, Santa Barbara, CA (US);
Eric R. Miller, Orcutt, CA (US);
Assignee:
RAYTHEON COMPANY, Waltham, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25D 7/12 (2006.01); C23C 14/18 (2006.01); C25D 3/54 (2006.01);
U.S. Cl.
CPC ...
C25D 7/12 (2013.01); C23C 14/18 (2013.01); C25D 3/54 (2013.01);
Abstract
A method for fabricating a wafer stack. The method includes forming a tantalum-nitride film on a substrate of the wafer stack using physical vapor deposition, forming a tantalum layer on the tantalum-nitride film using physical vapor deposition, and depositing indium on the tantalum layer using electroplating.