The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 05, 2023

Filed:

Apr. 13, 2021
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;

Inventors:

Chung-Ming Wang, Chiayi, TW;

Chih-Hsiung Peng, Miaoli County, TW;

Chi-Kang Chang, New Taipei, TW;

Kuei-Shun Chen, Hsinchu, TW;

Shih-Chi Fu, Hsinchu County, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 30/39 (2020.01); G06F 30/398 (2020.01); H01L 27/088 (2006.01); H01L 29/06 (2006.01); H01L 21/8234 (2006.01); H01L 27/02 (2006.01); G06F 111/20 (2020.01);
U.S. Cl.
CPC ...
G06F 30/39 (2020.01); H01L 21/823431 (2013.01); H01L 27/0207 (2013.01); H01L 27/0886 (2013.01); H01L 29/0653 (2013.01); G06F 30/398 (2020.01); G06F 2111/20 (2020.01);
Abstract

A method includes forming a first mandrel pattern and a second mandrel pattern. The first mandrel pattern includes at least first and second mandrels for a mandrel-spacer double patterning process. The second mandrel pattern includes at least a third mandrel inserted between the first and second mandrels. The first mandrel pattern and the second mandrel pattern include a same material. The first and second mandrels are merged together with the third mandrel to form a single pattern.


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