The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 29, 2023

Filed:

May. 13, 2021
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;

Inventors:

Xin-Hua Huang, Xihu Township, TW;

Kuan-Liang Liu, Pingtung, TW;

Kuo Liang Lu, Hsinchu, TW;

Ping-Yin Liu, Yonghe, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 37/00 (2006.01); H01L 23/00 (2006.01); B23K 37/04 (2006.01); H01L 21/683 (2006.01); H01L 21/67 (2006.01); H01L 21/20 (2006.01); H01L 21/762 (2006.01); B23K 101/40 (2006.01);
U.S. Cl.
CPC ...
H01L 24/94 (2013.01); B23K 37/04 (2013.01); B23K 37/0408 (2013.01); H01L 21/2007 (2013.01); H01L 21/67092 (2013.01); H01L 21/6831 (2013.01); H01L 21/6838 (2013.01); H01L 21/76251 (2013.01); H01L 24/75 (2013.01); H01L 24/83 (2013.01); B23K 2101/40 (2018.08); H01L 2224/753 (2013.01); H01L 2224/759 (2013.01); H01L 2224/75704 (2013.01); H01L 2224/75724 (2013.01); H01L 2224/75744 (2013.01); H01L 2224/83209 (2013.01); H01L 2224/83894 (2013.01); H01L 2224/83908 (2013.01); H01L 2924/1203 (2013.01); H01L 2924/12043 (2013.01); H01L 2924/1304 (2013.01); H01L 2924/1434 (2013.01); H01L 2924/1461 (2013.01);
Abstract

The present disclosure, in some embodiments, relates to a workpiece bonding apparatus. The workpieces bonding apparatus includes a first substrate holder having a first surface configured to receive a first workpiece, and a second substrate holder having a second surface configured to receive a second workpiece. A vacuum apparatus is positioned between the first substrate holder and the second substrate holder and is configured to selectively induce a vacuum between the first surface and the second surface. The vacuum is configured to attract the first surface and the second surface toward one another.


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