The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 15, 2023

Filed:

Oct. 18, 2021
Applicant:

Ebara Corporation, Tokyo, JP;

Inventors:

Naoki Shimomura, Tokyo, JP;

Mizuki Nagai, Tokyo, JP;

Assignee:

EBARA CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25D 17/00 (2006.01); C25D 17/10 (2006.01); C25D 17/02 (2006.01);
U.S. Cl.
CPC ...
C25D 17/10 (2013.01); C25D 17/007 (2013.01); C25D 17/02 (2013.01);
Abstract

A plating apparatus including a thief electrode that can be suitably maintained is provided. The plating apparatus includes a substrate holder holding a substrate, a thief electrode supporter supporting a thief electrode to be disposed outside the substrate, a plating tank configured to immerse the substrate in a plating solution for applying an electroplating treatment, a thief electrode maintenance tank configured to perform maintenance of the thief electrode, and a transport module configured to transport the thief electrode supporter to the plating tank and the thief electrode maintenance tank.


Find Patent Forward Citations

Shimomura, Naoki. (2023). Plating apparatus (U.S. Patent No. 11725297). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11725297

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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