The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 08, 2023

Filed:

Jun. 29, 2021
Applicant:

Power Integrations, Inc., San Jose, CA (US);

Inventors:

Alexey Kudymov, Ringoes, NJ (US);

Linlin Liu, Hillsborough, NJ (US);

Xiaohui Wang, East Brunswick, NJ (US);

Jamal Ramdani, Lambertville, NJ (US);

Assignee:

POWER INTEGRATIONS, INC., San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 29/778 (2006.01); H01L 29/205 (2006.01); H01L 23/31 (2006.01); H01L 29/40 (2006.01); H01L 23/29 (2006.01); H01L 29/417 (2006.01); H01L 21/3213 (2006.01); H01L 29/66 (2006.01); H01L 29/20 (2006.01); H01L 21/02 (2006.01); H01L 29/51 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7787 (2013.01); H01L 21/0217 (2013.01); H01L 21/32136 (2013.01); H01L 23/291 (2013.01); H01L 23/3171 (2013.01); H01L 23/3192 (2013.01); H01L 29/2003 (2013.01); H01L 29/205 (2013.01); H01L 29/404 (2013.01); H01L 29/41758 (2013.01); H01L 29/41775 (2013.01); H01L 29/517 (2013.01); H01L 29/66462 (2013.01); H01L 29/7786 (2013.01);
Abstract

An HFET includes a first and second semiconductor material. A first composite passivation layer includes a first insulation layer and a first passivation layer, and the first passivation layer is disposed between the first insulation layer and the second semiconductor material. The HFET includes a second passivation layer, where the first insulation layer is disposed between the first passivation layer and the second passivation layer. A gate dielectric is disposed between the second semiconductor material and the first passivation layer. A source electrode and a drain electrode are coupled to the second semiconductor material, and a gate electrode is disposed laterally between the source electrode and the drain electrode. A first gate field plate is disposed between the first passivation layer and the second passivation layer and electrically connected to the gate electrode, and a second gate field plate is disposed above first gate field plate.


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