The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 04, 2023

Filed:

Jun. 21, 2021
Applicant:

Asm Ip Holding B.v., Almere, NL;

Inventors:

Mikko Ritala, Espoo, FI;

Chao Zhang, Helsinki, FI;

Markku Leskelä, Espoo, FI;

Assignee:

ASM IP HOLDING B.V., Almere, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/311 (2006.01); H01L 21/306 (2006.01); H01L 21/02 (2006.01); H01L 21/285 (2006.01); H01L 21/033 (2006.01); H01L 21/3105 (2006.01);
U.S. Cl.
CPC ...
H01L 21/31138 (2013.01); H01L 21/0228 (2013.01); H01L 21/0337 (2013.01); H01L 21/28562 (2013.01); H01L 21/30604 (2013.01); H01L 21/31051 (2013.01); H01L 21/31127 (2013.01);
Abstract

Aspects of this disclosure relate to selective removal of material of a layer, such as a carbon-containing layer. The layer can be over a patterned structure of two different materials. Treating the layer to cause the removal agent to be catalytically activated by a first area of the patterned structure to remove material of the organic material over the first area at a greater rate than over a second area of the patterned structure having a different composition from the first area.


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