The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 27, 2023
Filed:
Apr. 26, 2021
Cymer, Llc, San Diego, CA (US);
Asml Netherlands B.v., Veldhoven, NL;
Wilhelmus Patrick Elisabeth Maria op 't Root, Nederweert, NL;
Thomas Patrick Duffey, San Diego, CA (US);
Herman Philip Godfried, Amsterdam, NL;
Frank Everts, Eindhoven, NL;
Joshua Jon Thornes, San Diego, CA (US);
Brian Edward King, San Diego, CA (US);
Cymer, LLC, San Diego, CA (US);
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method includes: producing a light beam made up of pulses having a wavelength in the deep ultraviolet range, each pulse having a first temporal coherence defined by a first temporal coherence length and each pulse being defined by a pulse duration; for one or more pulses, modulating the optical phase over the pulse duration of the pulse to produce a modified pulse having a second temporal coherence defined by a second temporal coherence length that is less than the first temporal coherence length of the pulse; forming a light beam of pulses at least from the modified pulses; and directing the formed light beam of pulses toward a substrate within a lithography exposure apparatus.