The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 27, 2023

Filed:

Sep. 13, 2019
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Sheng-chun Yang, Tainan, TW;

Yi-Ming Lin, Tainan, TW;

Chih-tsung Lee, Hsinchu, TW;

Yun-Tzu Chiu, Hsinchu, TW;

Chao-Hung Wan, Taichung, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/44 (2006.01); C23C 16/458 (2006.01); C23C 16/50 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
C23C 16/4412 (2013.01); C23C 16/4583 (2013.01); C23C 16/45565 (2013.01); C23C 16/50 (2013.01);
Abstract

Pumping liners for use in an apparatus for depositing a material on a work piece by chemical vapor deposition includes a plurality of unevenly spaced apertures are disclosed. Uneven spacing of the plurality of apertures produces a uniform flow of processing gases within a processing chamber with which the pumping liner is associated. Films of materials deposited onto a work piece by chemical vapor deposition techniques using disclosed pumping liners exhibit desirable properties such as uniform thickness and smooth and uniform surfaces.


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