The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 20, 2023

Filed:

May. 21, 2020
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Sage Toko Garrett Doshay, Saratoga, CA (US);

Rutger Meyer Timmerman Thijssen, San Jose, CA (US);

Ludovic Godet, Sunnyvale, CA (US);

Chien-An Chen, San Jose, CA (US);

Pinkesh Rohit Shah, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/22 (2006.01); G02B 5/20 (2006.01);
U.S. Cl.
CPC ...
G02B 5/20 (2013.01); G02B 2207/101 (2013.01);
Abstract

Embodiments of the present disclosure relate to methods for fabricating optical devices. One embodiment of the method includes disposing a structure material layer on a surface of a substrate and disposing a patterned photoresist over the structure material layer. The patterned photoresist has at least one device portion and at least one auxiliary portion. Each device portion and each auxiliary portion exposes unmasked portions of the structure material layer. The unmasked portions of structure material layer corresponding to each device portion and each auxiliary portion are etched. The etching the unmasked portions forms at least one optical device having device structures corresponding to the unmasked portions of at least one device portion and at least one auxiliary region having auxiliary structures corresponding to the unmasked portions of at least one auxiliary portion.


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