The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 20, 2023

Filed:

Mar. 27, 2020
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Brian Burrows, San Jose, CA (US);

Shu-Kwan Danny Lau, Mountain View, CA (US);

Zhiyuan Ye, Cupertino, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 25/10 (2006.01); G02B 7/182 (2021.01); C30B 25/08 (2006.01); C23C 16/52 (2006.01); C30B 25/16 (2006.01); C23C 16/44 (2006.01); G02B 7/18 (2021.01);
U.S. Cl.
CPC ...
C30B 25/10 (2013.01); C23C 16/4411 (2013.01); C23C 16/52 (2013.01); C30B 25/08 (2013.01); C30B 25/16 (2013.01); G02B 7/181 (2013.01); G02B 7/182 (2013.01);
Abstract

Methods and apparatus for an upper reflector assembly for use in a process chamber are provided herein. In some embodiments, an upper reflector assembly for use in a process chamber includes a reflector mounting ring; and upper reflector plate coupled to the reflector mounting ring and having an upper surface and lower surface, wherein the lower surface includes a plurality of linear channels extending substantially parallel to each other across the lower surface, and wherein the upper reflector plate includes air cooling slots extending from the upper surface to the lower surface.


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