The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 06, 2023

Filed:

Mar. 07, 2022
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Sai-Hooi Yeong, Zhubei, TW;

Chi-On Chui, Hsinchu, TW;

Chien-Ning Yao, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/78 (2006.01); H01L 29/06 (2006.01); H01L 29/66 (2006.01); H01L 29/423 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7853 (2013.01); H01L 29/0653 (2013.01); H01L 29/6653 (2013.01); H01L 29/6656 (2013.01); H01L 29/6681 (2013.01); H01L 29/66553 (2013.01); H01L 29/7848 (2013.01); H01L 29/0665 (2013.01); H01L 29/42392 (2013.01);
Abstract

A semiconductor device structure is provided. The semiconductor device structure includes a substrate having a base and a fin over the base. The semiconductor device structure also includes a first nanostructure over the fin and a second nanostructure over the first nanostructure. The semiconductor device structure further includes a gate stack wrapping around an upper portion of the fin, the first nanostructure, and the second nanostructure. In addition, the semiconductor device structure includes a first inner spacer between the fin and the first nanostructure and a second inner spacer between the first nanostructure and the second nanostructure. The semiconductor device structure includes a first low dielectric constant structure in the first inner spacer and a second low dielectric constant structure in the second inner spacer. The first low dielectric constant structure is larger than the second low dielectric constant structure.


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