The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 06, 2023
Filed:
Sep. 10, 2021
Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai, CN;
Peng Li, Shanghai, CN;
Feng Tang, Shanghai, CN;
Xiangzhao Wang, Shanghai, CN;
Yunjun Lu, Shanghai, CN;
Yang Liu, Shanghai, CN;
Xiangyu Wei, Shanghai, CN;
Yisha Cao, Shanghai, CN;
Changzhe Peng, Shanghai, CN;
Abstract
Apparatus and method for detecting wavefront aberration of an objective lens, comprising a wavefront detection system, a planar mirror, and a planar mirror adjusting mechanism; the objective lens is placed between planar mirror and wavefront detection system; planar mirror is positioned at focal point of the objective lens. A test wavefront emitted by wavefront detection system passes through the objective lens, gets reflected by the planar mirror, and t passes through the objective lens again; the wavefront detection system receives and detects the test wavefront to derive a phase distribution thereof; an angle of the planar mirror tilts at is adjusted to obtain different return wavefronts; a polynomial for expressing wavefront aberration is selected, and expressions corresponding to all the return wavefronts are calculated; result of fitting the wavefront aberration of the objective lens when expressed by the selected polynomial is derived through fitting with the polynomial.