The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 16, 2023

Filed:

Oct. 02, 2020
Applicant:

Plasma-therm Llc, St. Petersburg, FL (US);

Inventors:

Tsu-Wu Chiang, Milpitas, CA (US);

Russell Westerman, Land O' Lakes, FL (US);

Assignee:

Plasma-Therm LLC, St. Petersburg, FL (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/78 (2006.01); H01L 21/3065 (2006.01); H01L 21/683 (2006.01); H01J 37/32 (2006.01); H01L 23/31 (2006.01);
U.S. Cl.
CPC ...
H01L 21/78 (2013.01); H01J 37/32477 (2013.01); H01J 37/32715 (2013.01); H01L 21/3065 (2013.01); H01L 21/6831 (2013.01); H01L 21/6836 (2013.01); H01L 23/3171 (2013.01); H01L 2221/68327 (2013.01);
Abstract

The present invention provides a method for plasma dicing a substrate. The substrate is provided with a top surface and a bottom surface, the top surface of the substrate having a plurality of street areas and at least one device structure. The substrate is placed onto a support film on a frame to form a work piece. A process chamber having a plasma source is provided. A work piece support is provided within the plasma process chamber. The work piece is placed onto the work piece support. A plasma is generated from the plasma source in the plasma process chamber. The work piece is processed using the generated plasma and a byproduct generated from the support film while the support film is exposed to the generated plasma.


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