The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 16, 2023

Filed:

Jun. 23, 2022
Applicant:

Carl Zeiss Smt Gmbh, Oberkochen, DE;

Inventors:

Michael Budach, Hanau, DE;

Nicole Auth, Ginsheim-Gustavsburg, DE;

Assignee:

Carl Zeiss SMT GmbH, Oberkochen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/86 (2012.01); G01B 9/02 (2022.01); G01B 11/14 (2006.01); G03F 9/00 (2006.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
G03F 1/86 (2013.01); G01B 9/02 (2013.01); G01B 11/14 (2013.01); G03F 9/7061 (2013.01); H01J 37/28 (2013.01); H01J 2237/24578 (2013.01);
Abstract

The present application relates to an apparatus for determining a position of at least one element on a photolithographic mask, said apparatus comprising: (a) at least one scanning particle microscope comprising a first reference object, wherein the first reference object is disposed on the scanning particle microscope in such a way that the scanning particle microscope can be used to determine a relative position of the at least one element on the photolithographic mask relative to the first reference object; and (b) at least one distance measuring device, which is embodied to determine a distance between the first reference object and a second reference object, wherein there is a relationship between the second reference object and the photolithographic mask.


Find Patent Forward Citations

Loading…