The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 09, 2023
Filed:
Sep. 17, 2021
Applicant:
Senic Inc., Cheonan-si, KR;
Inventors:
Jong Hwi Park, Suwon-si, KR;
Il Hwan Yoo, Suwon-si, KR;
Kap-Ryeol Ku, Suwon-si, KR;
Jung-Gyu Kim, Suwon-si, KR;
Jung Woo Choi, Suwon-si, KR;
Eun Su Yang, Suwon-si, KR;
Byung Kyu Jang, Suwon-si, KR;
Sang Ki Ko, Suwon-si, KR;
Assignee:
SENIC INC., Cheonan-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/02 (2006.01); H01L 21/04 (2006.01); H01L 29/16 (2006.01); H01L 29/78 (2006.01); C30B 29/36 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67046 (2013.01); H01L 21/02057 (2013.01); H01L 21/02167 (2013.01); H01L 21/0445 (2013.01); H01L 29/1608 (2013.01); H01L 29/7813 (2013.01); C30B 29/36 (2013.01);
Abstract
A method of cleaning a wafer comprises: a scrubbing operation comprising treating a target wafer to be cleaned with a brush at a rotation rate of 200 rpm or less to prepare a brush cleaned wafer; and a cleaning operation comprising cleaning the brush cleaned wafer with a cleaning solution to prepare a cleaned bare wafer, wherein the cleaning operation comprises a first cleaning operation and a second cleaning operation sequentially.