The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 18, 2023
Filed:
Jun. 26, 2020
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventors:
Tom Moebert, Gera, DE;
Dirk Seidel, Jena-Leutra, DE;
Carsten Schmidt, Jena, DE;
Konrad Schoebel, Weimar, DE;
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2022.01); G06T 7/00 (2017.01); G03F 1/84 (2012.01);
U.S. Cl.
CPC ...
G06T 7/001 (2013.01); G03F 1/84 (2013.01); G06T 2207/20056 (2013.01); G06T 2207/30148 (2013.01);
Abstract
Methods and apparatuses for determining a quality of a mask of a photolithography apparatus are provided, which comprise a parallel calculation, using a plurality of computing devices, of a reference aerial image on the basis of a design of the mask and optical properties of the photolithography apparatus on a plurality of computing devices.